Inductively Coupled Plasma – Mass Spectrometry

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Make: PerkinElmer

Model: NexION 1000

Ionisation Source: Argon plasma
Analyser: Three-Quadrupole
Range: 7 to 238 amu (Li to U)

  • ICP-MS is an analytical technique for the determination of the elemental composition of a sample.
  • ICP-MS is superior to AAS and OES in terms of sensitivity and accuracy as it capable of detecting metals at concentrations as low as 0.25ppt.
This technique is useful for researchers working on trace metal analysis especially in the field of pharmaceuticals, food technology, and environmental sciences.
G07, GDN Block,
Department of Manufacturing Engineering,
Centre of Excellence in Additive Manufacturing,
School of Mechanical Engineering.

Dr. Akella Siva Rama Krishna
Dr. Vasudevan R
G07, GDN Block,
Department of Manufacturing Engineering,
Centre of Excellence in Additive Manufacturing,
School of Mechanical Engineering,

E-mail: smec.icpms@vit.ac.in

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