Multi-Zone Chemical Vapour Deposition (CVD) system

Home Facilities Multi-Zone Chemical Vapour Deposition (CVD) system

Make: Ants innovation private limited

Model:

Year: 2022
Measuring Tc : K type
Control Tc : K type
Maximum Temperature: 1100 C
Working Temperature: 1050 C
Temperature for profiling : 1050 C
Hot Zone(mm): 55X400
Semiconductor Thin Films
  • Growth of epitaxial layers (Si, Ge, GaAs, GaN, InP, etc.) with controlled doping and thickness
Nanomaterial’s Synthesis
  • Controlled growth of carbon nanotubes (CNTs) and graphene, where catalyst activation and CNT elongation need different zones.
  • Nanowires and quantum dots (Si, GaN, ZnO, etc.) with composition gradients or heterostructures
Room No.: 402- Technology Tower,
High Temperature lab
Centre for Functional Materials,
Vellore Institute of Technology (VIT), Vellore.
Dr.Ramesh M Thamankar
402 Technology Tower
Centre for Functional Materials (CFM),
Vellore Institute of Technology - Vellore Campus,
Thiruvalam Road, Vellore – 632 014, Tamil Nadu, India.

Office Phone: +91 – 416 – 220 2353
Email id: rameshm.thamankar@vit.ac.in
Instrument email ID: cfm.mzcvds@vit.ac.in
S. No. Experiment Details UG /PG Students from Academic Institutions (in INR) Research Scholar from Academic Institution (in INR) Project Staff from Academic Institution (in INR) Faculty Members from Academic Institutions (in INR) Research Scientist from R&D Organizations (in INR) Industry Personnel from Industry (in INR)
1 Multi-Zone Chemical Vapour Deposition (CVD) system 500 1500 1500 1500 3000 3000

* Charges for per sample in INR (+ applicable GST)