Multisource Deposition System

Home Facilities Multisource Deposition System

Make: Hind High Vacuum (HHV)

Model: ATS 500

  • The system is provided with turbo molecular pump backed by dry scroll pump for high vacuum environment enables the production of coatings with minimum defects and impurities.
  • The substrate holder platform and associated fixture is designed to accommodate a 4-inch substrate or smaller substrate.
  • A rotary drive mechanism is provided for the continuous rotation of 360⁰ and rotation speed adjustable up to 20 rpm.
  • Substrate heater is provided to heat the substrate from R.T to 300 deg. C.
  • M/s. Inficon make deposition controller Model SQC-310 for sequential evaporation monitoring and control.
  • The ultimate vacuum better than 1 x 10-6 mbar range can be achieved in clean, cold, degassed, chamber.
  • The system is capable of coating thin films using thermal and E-beam evaporation, DC and RF magnetron Sputtering
Sputtering
  • Three numbers of HHV make 2” indirectly water cooled, flexible sputter sources
  • HHV make 1 kW DC power supply are provided for DC sputtering.
  • RF power supply: 300W, 13.56 MHz RF power supply with auto matching network, network controller
  • Accepted source materials: Cu, SiO2, Al, Al2O3
Thermal and E-beam evaporation
  • A 3KW EB3 gun is used for E-beam evaporation with 4cc volume crucibles
  • One set of low temperature (LT) evaporation source is provided
  • Accepted source materials: Cr, Ag, Al
The Multi Source Deposition System is designed for a wide range of applications such as
  • Semiconductors
  • Optical coatings
  • Metal coatings
  • Organic electronics
  • Hard coatings
  • Lift-off coatings
Room Number: TT027
Technology Tower
Centre for Nanotechnology Research (CNR)
Dr. Raja Sellappan
Room Number: TT027
Technology Tower
Centre for Nanotechnology Research (CNR)
PH: 0416-2202407
Mail id: multisourcefist@vit.ac.in