Multisource Deposition System

Home Facilities Multisource Deposition System

Make: Hind High Vacuum (HHV)

Model: ATS 500

  • The system is provided with turbo molecular pump backed by dry scroll pump for high vacuum environment enables the production of coatings with minimum defects and impurities.
  • The substrate holder platform and associated fixture is designed to accommodate a 4-inch substrate or smaller substrate.
  • A rotary drive mechanism is provided for the continuous rotation of 360⁰ and rotation speed adjustable up to 20 rpm.
  • Substrate heater is provided to heat the substrate from R.T to 300 deg. C.
  • M/s. Inficon make deposition controller Model SQC-310 for sequential evaporation monitoring and control.
  • The ultimate vacuum better than 1 x 10-6 mbar range can be achieved in clean, cold, degassed, chamber.
  • The system is capable of coating thin films using thermal and E-beam evaporation, DC and RF magnetron Sputtering
Sputtering
  • Three numbers of HHV make 2” indirectly water cooled, flexible sputter sources
  • HHV make 1 kW DC power supply are provided for DC sputtering.
  • RF power supply: 300W, 13.56 MHz RF power supply with auto matching network, network controller
  • Accepted source materials: Cu, SiO2, Al, Al2O3
Thermal and E-beam evaporation
  • A 3KW EB3 gun is used for E-beam evaporation with 4cc volume crucibles
  • One set of low temperature (LT) evaporation source is provided
  • Accepted source materials: Cr, Ag, Al
The Multi Source Deposition System is designed for a wide range of applications such as
  • Semiconductors
  • Optical coatings
  • Metal coatings
  • Organic electronics
  • Hard coatings
  • Lift-off coatings
Room Number: TT027
Technology Tower
Centre for Nanotechnology Research (CNR)
Dr. Raja Sellappan
Room Number: TT027
Technology Tower
Centre for Nanotechnology Research (CNR)
PH: 0416-2202407
Mail id: multisourcefist@vit.ac.in
EQUIPMENT_NAME UG /PG Students from Academic Institution (in INR) Research Scholar from Academic Institution (in INR) Project Staff from Academic Institution (in INR) Faculty Members from Academic Institution (in INR) Research Scientist from R&D Organizations (in INR) Industry Personnel from Industry (in INR) Personnel from Non - Government Organization (in INR)
Multisource deposition System Thermal Evaporation with operator provided source 1250 1250 1250 1250 1250 1250 1250
Multisource deposition System E-beam Evaporation with operator provided source 1750 1750 1750 1750 1750 1750 1750
Multisource deposition System DC sputtering with operator provided source 1750 1750 1750 1750 1750 1750 1750
Multisource deposition System RF sputtering with operator provided source 2250 2250 2250 2250 2250 2250 2250
Multisource deposition System Thermal Evaporation with own source 800 800 800 800 800 800 800
Multisource deposition System E-beam Evaporation with own source 1000 1000 1000 1000 1000 1000 1000
Multisource deposition System DC sputtering with own source 1250 1250 1250 1250 1250 1250 1250
Multisource deposition System RF sputtering with own source 1500 1500 1500 1500 1500 1500 1500