PLANETARY MONOMILL
Make:FRITSCH Model:03964 Capabilities Working principle : planetary (impact) mill, single grinding station.Grinding bowl sizes available: 500, 250, 80, 45, 12 ml (various bowl materials)Grinding ball diameters : 0.1 mm – 40 mm;Final fineness can reach :< 1 µm (material-dependent).Max. Feed size : ≈ 10 mm (depends on material).Sample / charge quantity : 0.5 – 225 ml.Electrical requirements : 100–120 / 200–240 […]
DC & RF Magnetron Sputtering
Make:Vacutech System Model:C4HT / Keysight B2902B Capabilities Year: 2018Chamber Volume: Approx.. 70 LRF Power: Max 300W with attached auto tunerDC power: Max 1000 VSubstrate Heater: Max 300°C Applications Thin Film Metallization Gold (Au), Silver (Ag), Copper (Cu), Aluminum (Al), and Tungsten (W) coatings. Used in microelectronics, interconnects, and contacts.Reflective & Decorative Coatings: Mirror coatings (Al, Ag) for optics, solar panels, […]
Probe Station with Source Meter Unit
Make:EverBeing Int’l Model:C4HT / Keysight B2902B Capabilities Probe Station: Make: EverBeing Int’l; Model: C4HT Micropositioners :4 probes with magnetic-lock-based Probe:Tungsten tips of 5µm diameter Temperatures: RT – 200°C(Heatable vacuum chuck) Optical microscope: Magnification: 150x; Camera: Moticam 8MP Source Measurement Unit (SMU) – Model:Keysight B2902B Voltage range: ±210 V Current range:±3 A DC, ±10.5A pulsed Accuracy: 0.015% Source and measurement Resolution : 10 fA […]
Muffle Furnace
Make:Ants innovation private limited Model: Capabilities Year: 2023Maximum Temperature: 1700 CWorking Temperature: 1600 CHot Zone(mm):55X400 Applications Materials Science & Metallurgy Heat treatment of metals (annealing, tempering, stress relieving). Hardening or softening materials for microstructure studies. Sintering of ceramics, powders, and composite materials. Melting and refining of small metal samples. General Uses Calibration and testing of thermocouples and sensors. […]
LCR METER WITH TEMPERATURE CONTROLLER
Make:NF Corporation Japan Model:ZM2378 Capabilities Frequency range : 1 mHz – 5.5 MHz.Basic accuracy : 0.08%.Measurement signal : 10 mVrms – 5 Vrms, 1 µArms – 200 mArms.DC bias : Internal 0–2.5 V or 0–5.0 VMeasurement time / speed : typical ≈2 ms(1kHz-1MHz) or 10ms(120Hz)Measured parameters : |Z|, |Y|, L, C, R, G (plus Q, D, θ, X, B, Rs, Rp.Interfaces […]
Electrospinning Machine
Make:NF Corporation Japan Model:ZM2378 Capabilities Frequency range : 1 mHz ‑ 5.5 MHz.Basic accuracy : 0.08%.Measurement signal : 10 mVrms ‑ 5 Vrms, 1 µArms ‑ 200 mArms.DC bias : Internal 0‑2.5 V or 0‑5.0 VMeasurement time / speed : High-speed modes,typical ≈2 msMeasured parameters : |Z|, |Y|, L, C, R, G (plus Q, D, θ, X, B, Rs, Rp Applications […]
Electrochemical workstation with solar stimulator
Make:Biologic-SP-150e / NewportLCS-100 94011A Model: Capabilities Electrochemical workstation Make and Model: Biologic-SP-150e Year: 2023 Voltage: ± 10 V Current: ± 10 µA to ± 1 A EIS: 1 MHz to 10 µHz Solar Simulator: Make and Model: NewportLCS‑100 94011A Source: 100 W xenon lamp One sun illumination withAM 1.5G Filter Class ABB spectral match Applications […]
Multi-Zone Chemical Vapour Deposition (CVD) system
Make:Ants innovation private limited Model: Capabilities Year: 2022Measuring Tc : K typeControl Tc : K typeMaximum Temperature: 1100 CWorking Temperature: 1050 CTemperature for profiling : 1050 CHot Zone(mm): 55X400 Applications Semiconductor Thin Films Growth of epitaxial layers (Si, Ge, GaAs, GaN, InP, etc.) with controlled doping and thickness Nanomaterial’s Synthesis Controlled growth of carbon nanotubes (CNTs) and graphene, where catalyst activation and […]
Battery Test system
Make:BioLogic Model:BCS-805 Capabilities Channels : 8 per module Voltage Range : 0‑10 V, 40 µV resolution, <±0.3 mV accuracy Current Capability : ±150 mA max, 5 ranges from 100 mA‑10 µA Current resolution : Down to 0.2 nA, <0.05 % accuracy EIS Capability : Optional; 10 kHz‑10 mHz, up to 2.5 V & 60 mA amplitude Sampling […]
Pulsed Laser Deposition (PLD)
Make:Coherent Model:COMPex 201 F Capabilities Laser System: Gas : KrFWavelength : 248 nmMaximum Energy : 750 mJPulse duration : 20 nsMaximum Frequency : 10 Hz Deposition Chamber: 1. Standard Chamber:Maximum deposition area: 1 cm x 1 cmTarget size : 1 inchTargets : 6Substrate temperature : 800 °CTarget RasteringMaximum Sample size : 1 cm x 1 […]